Huawei is rapidly researching on chipset printing technologies

Huawei is continuously researching chipset printing technologies and the recent two patents suggest the research is making rapid progress. Adding to this, Huawei is also researching new patents for the extreme ultraviolet light of lithography machines.

Lithography:

Lithography technology is the most critical step in chipset manufacturing. The reason why chip technology has been able to develop gradually from 100 microns to 3nm in the past 60 years is due to lithography machines. Without a lithography machine, there’s no chipset manufacturing.

Therefore, Huawei is researching new technologies for chipset printing and manufacturing.

Let’s take a brief look at these patents.

First patent:

A patent was filed on May 13, 2021, have now been published. The technical details of this patent cover the related technologies of extreme ultraviolet light.

Details show a lithography device, and a control method thereof, which relate to the field of optics and can solve the problem that coherent light cannot be uniformed due to the formation of a fixed interference pattern.

The reflective surface of the reflective mirror includes a plurality of micro-reflective surfaces. The plurality of micro-reflecting surfaces includes a first micro-reflecting surface and a second micro-reflecting surface adjacent to the first micro-reflecting surface.

There is a height difference Ah between the first micro-reflecting surface and the second micro-reflecting surface, and the height difference Δh Located in the interval of (0, ka] where λ is the wavelength of extreme ultraviolet light, while k is a positive integer greater than or equal to 1.

Second patent:

The second patent is titled “Mirror, Photolithography Device and Control Method”. It has a patent application number of CN202110524685.X. ​This can solve the problem that coherent light cannot be homogenized due to the formation of a fixed interference pattern, which is also a common problem in EUV lithography.

The patent shows a lithography device, which makes the accumulated light intensity of the illumination field of view uniform during the exposure time by continuously changing the interference pattern formed by coherent light.

This will the device to achieve the purpose of uniform light. It also solves the problem in the related art that the light cannot be uniformed due to the coherent light forming a fixed interference pattern.

It can be observed that Huawei has been researching to solve the chip neck problem for lithography machines because it’s an essential part of breakthroughs for chipset development.

Outcome:

It seems that Huawei is pushing itself to the limits in the field of lithography machines. Meanwhile, the lithography technology shows that Huawei will make a breakthrough, combined with other companies in the future.

Hence, it’s possible that Huawei could achieve a 100% Chinese chipset printing machine in the near future.